Photoresist coating

Photoresist coating

Two-Stage Spin Coater


Contact person

Mr. Huang
  • Specification
  • Describe
Applicable size: Fragment ~ 6” Wafer substrate.
Appearance material: The PP board is welded together, which is resistant to acid and alkali corrosion.
The suction cup is separated
Work procedure: Photosensitive liquid coating The first stage controls the speed and the second stage controls the speed
Operating basin cover: Made of SUS, round pot design.
Feeding method: Manual feeding, with a hole in the middle and cover
Rotating motor: DC motor
Suction cup specifications: A set of aluminum suction cups are protected by anodized precision grinding molds.
Rotating speed: 300 ~ 8000 rpm±10rpm。
Rotation time setting: 0.1- 999 sec (LED direct display) can be set to switch between seconds and minutes

Product consultation

Please fill in your contact information and the content you want to inquire, we will reply to you as soon as possible, thank you.

  • Name*

  • Tel*

  • Mail*

  • Company*

  • Title/Department

  • Product name

  • Inquiry content