Photoresist coating
| Equipment summary: | Applicable size: 2"-12" Wafer substrate. |
|---|---|
| Basic specifications: | |
| Appearance material: | The PP board is welded together, which can resist corrosion. |
| Operating basin cover: | Made of SUS, round pot design. |
| Basin cover flip: | Separate transparent PVC upper cover. |
| Suction cup specifications: | A set of aluminum suction cups are protected by anodized precision grinding molds. |
| Operation and feeding method: | Manual direct input, manual feeding. |
| Liquid type: | Photoresist, solvent. |
| Motor: | AC Servo Motor (speed: 10-6000 RPM) |
| With vacuum pump (with PP dust cover) | |
| Vacuum seepage protection: | Yes, indirect protection design. |
| Vacuum brief inspection know: | Yes (digitally designed vacuum value Kpa lower limit protection). |
| Protection and control: | There is a complete state of the device, and an abnormality is detected. |
| Electric control system: | |
| Software: | PLC。 |
| Control method: | Color touch man-machine system, spindle speed graph. |
| Recipe module and number of segments setting: | 100 groups of formulas, each formula has 30 segments. |
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